Characterization of high refractive index semiconductor films by surface plasmon resonance

Applied Optics

Volumn 45, Issue 25, 2006, Pages 6640-6645

  Patskovsky, Sergiy ^a   Bah, Souleymane ^a   Meunier, Michel ^a   Kabashin, Andrei V ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

BIOSENSORS; LASER ABLATION; OPTICAL VARIABLES MEASUREMENT; REFRACTION; REFRACTIVE INDEX; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SURFACE PLASMON RESONANCE;

GERMANIUM FILMS; KRETECHMANN RAETHER GEOMETRY; LASER ABLATED POROUS SILICON; OPTICAL MEASUREMENTS;

SEMICONDUCTING FILMS;

EID: 33750348500     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.45.006640     Document Type: Article

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