Parallel DSMC gasflow simulation of an in-line coater for reactive sputtering

Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics)

Volumn 4192 LNCS, Issue , 2006, Pages 383-390

  Pflug, A ^a   Siemers, M ^a   Szyszka, B ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; GAS METERS; MONTE CARLO METHODS; PARALLEL PROCESSING SYSTEMS; PHASE SHIFT; PROCESS CONTROL; SPUTTERING;

DIRECT SIMULATION MONTE CARLO (DSMC); IN LINE SPUTTERING COATERS; PRESSURE FLUCTUATIONS; REACTIVE SPUTTERING PROCESS KINETICS;

COATINGS;

EID: 33750264133     PISSN: 03029743     EISSN: 16113349     Source Type: Book Series    
DOI: 10.1007/11846802_53     Document Type: Conference Paper

References (6)

1. [Ber05] S. Berg, T. Nyberg, Fundamental understanding and modeling of reactive sputtering processes Thin Solid Films 476 (2005) 215-230.
2. [Ber87] S. Berg, H. O. Blohm, T. Larsson, C. Nender, Modeling of reactive sputtering of compound materials, J. Vac. Sci. Technol. A5 (1987) 202-7.
3. [Bir94] G. A. Bird, Molecular gas dynamics and the direct simulation of gas flows, Oxford Engineering Science Series 42 (1994).
4. [Kir83] S. Kirkpatrick, C. D. Gelatt, M. P. Vecci, Optimization by Simulated Annealing, Science 220 (1983) 671-680.
5. th SVC Tech. Conf. (2004) 155-160.
6. th SVC Tech. Conf. (2003) 241-247.