In-line small-spot X-ray fluorescence assessment of electroplating and chemical mechanical polishing

Journal of the Electrochemical Society

Volumn 153, Issue 9, 2006, Pages

  Gueneau De Mussy, J P ^a   Bottiglieri, G ^a   Heylen, N ^a   Carbonell, L ^a   O'Dell, J ^b   Agnihotri, D K ^b,d   Tokar, A ^c   Mazor, I ^c  

^a IMEC   (Belgium)

^b Jordan Valley Semiconductors UK Ltd   (United Kingdom)

^c Jordan Valley   (Israel)

^d ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL POLISHING; ELECTROCHEMISTRY; ELECTROPLATING; FLUORESCENCE; SCANNING ELECTRON MICROSCOPY; X RAY SCATTERING;

CHEMICAL MECHANICAL POLISHING (CMP); ELECTRICAL RESISTANCE DATA; HIGH-RESOLUTION TECHNIQUES; X-RAY FLUORESCENCE;

COPPER;

EID: 33750132770     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2219705     Document Type: Article

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