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Volumn 2006, Issue , 2006, Pages 842-845

Nanometer-order control of MEMS ribbons for blazed grating light valves

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; LIGHT MODULATORS; NANOTECHNOLOGY; OPTIMIZATION; SCANNING; VALVES (MECHANICAL);

EID: 33750104206     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (8)

References (7)
  • 1
    • 0039225612 scopus 로고    scopus 로고
    • The grating light valve: Revolutionizing display technology
    • San Jose, February
    • D. Bloom, "The Grating Light Valve: Revolutionizing Display Technology," Projection Displays III Symposium, SPIE Proceedings Volume 3013, San Jose, February 1997.
    • (1997) Projection Displays III Symposium, SPIE Proceedings , vol.3013
    • Bloom, D.1
  • 2
    • 33750118367 scopus 로고    scopus 로고
    • USP6639722
    • David T. Amm et al., USP6639722.
    • Amm, D.T.1
  • 3
    • 33646205078 scopus 로고    scopus 로고
    • High-performance blazed GxL™ device for large-area laser projector
    • San Jose, January. (To be published)
    • Y. Ito et al., "High-performance blazed GxL™ device for large-area laser projector", SPIE Photonic West 2006, San Jose, January 2006. (To be published)
    • (2006) SPIE Photonic West 2006
    • Ito, Y.1
  • 4
    • 33748554085 scopus 로고    scopus 로고
    • High contrast and efficient blazed grating light valve for full-HD 5000 lumen laser projector
    • January. (To be published)
    • H. Tamada et al., "High contrast and efficient blazed grating light valve for full-HD 5000 lumen laser projector", ICCE2006, January 2006. (To be published)
    • (2006) ICCE2006
    • Tamada, H.1
  • 6
    • 5444243242 scopus 로고    scopus 로고
    • A 1,000-lumen grating light valve laser projector
    • Hiroshima, Japan, Dec.4-6
    • N. Eguchi et al., "A 1,000-lumen Grating Light Valve laser projector" IDW02, Hiroshima, Japan, Dec.4-6, 2002.
    • (2002) IDW02
    • Eguchi, N.1
  • 7
    • 33646165940 scopus 로고    scopus 로고
    • A behavior of Xenon difluoride etching on poly-Silicon sacrificial layer for fabrication of MEMS device
    • T. Taniguchi et al., "A behavior of Xenon difluoride etching on poly-Silicon sacrificial layer for fabrication of MEMS device", Ext. abstract of 2002 SSDM, pp.686-687, 2002.
    • (2002) Ext. Abstract of 2002 SSDM , pp. 686-687
    • Taniguchi, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.