Towards focusing using photonic crystal flat lens

Opto-Electronics Review

Volumn 14, Issue 3, 2006, Pages 225-232

  Fabre, N ^a   Fasquel, S ^a   Legrand, C ^a   Melique X ^a   Muller, M ^a   Francois M ^a   Vanbesien O ^a   Lippens, D ^a  

^a INSTITUT D ELECTRONIQUE   (France)

Author keywords

Negative refraction; Optical wavelengths; Photonic crystals fabrication

Indexed keywords

COMPUTERIZED TOMOGRAPHY; DISPERSION (WAVES); III-V SEMICONDUCTORS; INDIUM PHOSPHIDE; LIGHT REFRACTION; REFRACTIVE INDEX; SEMICONDUCTING INDIUM PHOSPHIDE;

DEEP REACTIVE ION ETCHING; DISPERSION BRANCHES; DISPERSION PROPERTIES; NEGATIVE REFRACTIONS; NEGATIVE REFRACTIVE INDEX; OPTICAL WAVELENGTH; SEMICONDUCTOR LAYERS; TECHNOLOGICAL CHALLENGES;

PHOTONIC CRYSTALS;

EID: 33750060712     PISSN: 12303402     EISSN: 18963757     Source Type: Journal    
DOI: 10.2478/s11772-006-0030-0     Document Type: Article

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