NEW OXYGEN PLASMA DEVELOPABLE UV SENSITIVE RESIST.

Technical Papers, Regional Technical Conference - Society of Plastics Engineers

Volumn , Issue , 1985, Pages 177-196

  MacDonald, Scott A ^a   Ito, Hiroshi ^a   Hiraoka, Hiroyuki ^a   Willson, C Grant ^a  

^a IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS - PHOTOCHEMICAL REACTIONS; LITHOGRAPHY; POLYMERS - PHOTOREACTIVITY;

NEGATIVE RESISTS; OXYGEN REACTIVE-ION-ETCHING; PLASMA DEVELOPABLE RESISTS; RIE;

PHOTORESISTS;

EID: 0022323536     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (23)