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Volumn 914, Issue , 2006, Pages 331-337
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Effect of Cu migration in a field induced dielectric failure
a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
COMPUTER SIMULATION;
COMPUTER SYSTEM RECOVERY;
DIELECTRIC MATERIALS;
ELECTROMIGRATION;
FREQUENCY DIVISION MULTIPLEXING;
MATHEMATICAL MODELS;
E MODEL;
METAL-INSULATOR-SEMICONDUCTOR (MIS);
SPACE-CHARGE EFFECT;
TIME-DEPENDENT DIELECTRIC BREAKDOWN (TDDB);
COPPER;
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EID: 33749593186
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-0914-f06-07 Document Type: Conference Paper |
Times cited : (3)
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References (7)
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