Summary of ISO/TC201 technical report: ISO/TR 18392: 2005 - Surface chemical analysis - X-ray photoelectron spectroscopy - Procedures for determining backgrounds

Surface and Interface Analysis

Volumn 38, Issue 7, 2006, Pages 1173-1175

  Kover L ^a  

^a INSTITUTE OF NUCLEAR RESEARCH ATOMKI   (Hungary)

Author keywords

Background determination; Inelastic and elastic electron scattering; International Organization for Standardization; ISO; Quantitative surface analysis; X ray photoelectron spectroscopy; XPS

Indexed keywords

BACKGROUND DETERMINATION; ELASTIC ELECTRON SCATTERING; INTERNATIONAL ORGANIZATION FOR STANDARDIZATION; QUANTITATIVE SURFACE ANALYSIS;

AUGER ELECTRON SPECTROSCOPY; ELECTRON SCATTERING; ELECTRONS; NANOSTRUCTURED MATERIALS; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE STRUCTURE;

EID: 33749575579     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2365     Document Type: Article

References (11)

1. ASTM E 995-04, Standard guide for background subtraction techniques in Auger electron and X-ray photoelectron spectroscopy, Annual Book of ASTM Standards 2005, Vol. 3.06. ASTM International: West Conshohocken, PA, 2005; 674.
2. Seah MP. In Practical Surface Analysis, Vol. 1, Chapt. 5. Briggs D, Seah MP (eds). John Wiley and Sons: New York, 1990; 233.
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7. (see: www.nist.gov/srd/nist/nist100.htm).
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