Comparative photocatalytic behavior of Ta catalysts prepared by d.c.-sputtering, sol-gel and grafting in acetone degradation

Catalysis Today

Volumn 118, Issue 3-4 SPEC. ISS., 2006, Pages 433-439

  Parvulescu, Vasile I ^a   Visinescu, Claudia ^a,b   Parvulescu, Viorica ^a   Marcu, Victor ^c   Levy, Francis ^b  

^a UNIVERSITY OF BUCHAREST   (Romania)

^b EPFL   (Switzerland)

^c ISRAEL ELECTRIC CORPORATION   (Israel)

Author keywords

Acetone photodegradation; AFM; Reactive d.c. magnetron sputtering; Sol gel and grafting; Ta doped photocatalysts; XPS; XRD

Indexed keywords

ACETONE PHOTODEGRADATION; ADSORPTION-DESORPTION ISOTHERMS; TA-DOPED PHOTOCATALYSTS;

ACETONE; ATOMIC FORCE MICROSCOPY; DEGRADATION; GRAFTING (CHEMICAL); NUCLEAR MAGNETIC RESONANCE; SOL-GELS; SPUTTERING; TANTALUM; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CATALYSTS;

EID: 33749510044     PISSN: 09205861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cattod.2006.07.035     Document Type: Article

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