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Volumn 118, Issue , 1998, Pages 485-493

Reactive sputtering as a tool for preparing photocatalysts

Author keywords

[No Author keywords available]

Indexed keywords


EID: 21744445155     PISSN: 01672991     EISSN: None     Source Type: Book Series    
DOI: 10.1016/s0167-2991(98)80215-2     Document Type: Article
Times cited : (6)

References (22)
  • 15
    • 0003989643 scopus 로고    scopus 로고
    • Semiconductor Nanoclusters - Physical, Chemical and Catalytic Aspects
    • P. V. Kamat and D. Meisel (eds.), Elsevier
    • P. V. Kamat and D. Meisel (eds.), Semiconductor Nanoclusters - Physical, Chemical and Catalytic Aspects, Stud. Surf. Sci. Catal., Elsevier, 1997.
    • (1997) Stud. Surf. Sci. Catal.
  • 19
    • 0003392447 scopus 로고
    • Wiley & Sons (eds.), New-York
    • Wiley & Sons (eds.), X-Ray Diffraction Procedures, New-York, 1974.
    • (1974) X-Ray Diffraction Procedures


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.