Etching and structural changes of polystyrene films during plasma immersion ion implantation from argon plasma

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 251, Issue 2, 2006, Pages 413-418

  Kondyurin, A ^a   Gan, B K ^a   Bilek, M M M ^a   Mizuno, K ^a   McKenzie, D R ^a  

^a UNIVERSITY OF SYDNEY   (Australia)

Author keywords

Etching; Ion beam; Polystyrene; Surface modification; Thin film

Indexed keywords

ELECTRON ENERGY LEVELS; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION BEAMS; ION IMPLANTATION; OPTICAL MICROSCOPY; PLASMA APPLICATIONS; POLYSTYRENES; SURFACE TREATMENT; THIN FILMS;

ETCHING RATES; GEL FORMATION; PLASMA IMMERSION; POLYSTYRENE FILMS;

PLASTIC FILMS;

EID: 33749369139     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.06.027     Document Type: Article

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