A finite difference method for studying thermal deformation in a double-layered thin film exposed to ultrashort pulsed lasers

International Journal of Thermal Sciences

Volumn 45, Issue 12, 2006, Pages 1179-1196

  Wang, Haojie ^a   Dai, Weizhong ^a   Melnik, Roderick ^b  

^a Louisiana Tech University   (United States)

^b WILFRID LAURIER UNIVERSITY   (Canada)

Author keywords

Double layered thin film; Finite difference method; Staggered grid; Thermal deformation; Two step model; Ultrashort pulsed lasers

Indexed keywords

DEFORMATION; ELECTRONS; STRAIN RATE; THIN FILMS; TRANSPORT PROPERTIES; ULTRASHORT PULSES;

DOUBLE-LAYERED THIN FILMS; STAGGERED GRID; THERMAL DEFORMATION; TRANSPORT EQUATIONS; TWO-STEP MODEL;

FINITE DIFFERENCE METHOD;

EID: 33749236433     PISSN: 12900729     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijthermalsci.2006.03.001     Document Type: Article

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