Bismuth-based pyrochlore thin films deposited at low temperatures for embedded capacitor applications

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 9 B, 2006, Pages 7325-7328

  Park, Jong Hyun ^a   Xian, Cheng Ji ^a   Seong, Nak Jin ^a   Yoon, Soon Gil ^a   Kang, Hyung Dong ^b   Lee, Jeong Won ^b   Kim, Woon Chun ^b   Lim, Sung Taek ^b   Sohn, Seung Hyun ^b   Moon, Jin Seok ^b   Jin, Hyun Ju ^b   Jung, Hyung Mi ^b   Lee, Seung Eun ^b   Chung, Yul Kyo ^b  

^a Chungnam National University   (South Korea)

^b Samsung Electro Mechanics   (South Korea)

Author keywords

Bismuth based pyrochlore films; Breakdown strength; Capacitance density; Dielectric properties; Pulsed laser deposition

Indexed keywords

BISMUTH COMPOUNDS; CAPACITORS; ELECTRIC BREAKDOWN; LAMINATES; LEAKAGE CURRENTS; PRINTED CIRCUIT BOARDS; PULSED LASER DEPOSITION;

BISMUTH-BASED PYROCHLORE FILMS; BREAKDOWN STRENGTH; CAPACITANCE DENSITY;

THIN FILMS;

EID: 33749019443     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.7325     Document Type: Article

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