Low-damage atomic layer modification of self-assembled monolayer using neutral beam process

Applied Physics Letters

Volumn 89, Issue 12, 2006, Pages

  Ishikawa, Yasushi ^a   Samukawa, Seiji ^a   Ishida, Takao ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALCOHOLS; PHOTONS; PLASMA THEORY; SURFACE PROPERTIES; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

NEUTRAL BEAMS (NB); PLASMA PROCESSES; SURFACE DECOMPOSITION;

SELF ASSEMBLY;

EID: 33748980993     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2357001     Document Type: Article

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