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Volumn 40, Issue 3, 2007, Pages 498-502

Correlation between the surface quality and the abrasive grains wear in optical glass lapping

Author keywords

Abrasive wear; Alumina abrasive grains; Glass; Lapping

Indexed keywords

ALUMINA; LAPPING; OPTICAL MICROSCOPY; PARTICLE SIZE ANALYSIS; SURFACE PROPERTIES; SURFACE TREATMENT; WEAR RESISTANCE;

EID: 33748964469     PISSN: 0301679X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.triboint.2006.05.001     Document Type: Article
Times cited : (29)

References (9)
  • 1
    • 0033317667 scopus 로고    scopus 로고
    • J.C. Lambropoulos, Yi Li, P. Funkenbusch, J. Ruckman, Noncontact estimate of grinding induced subsurface damage. SPIE conference on optical manufacturing and testing III, vol. 3782. 1999. p. 41-50.
  • 3
    • 0001611894 scopus 로고
    • The theory and design of plate glass polishing machines
    • Preston F.W. The theory and design of plate glass polishing machines. J Soc Glass Technol 11 (1927) 214-256
    • (1927) J Soc Glass Technol , vol.11 , pp. 214-256
    • Preston, F.W.1
  • 4
    • 0031098690 scopus 로고    scopus 로고
    • Loose abrasive lapping hardness of optical glasses and its interpretation
    • Lambropoulos J.C., Su X., and Tong F. Loose abrasive lapping hardness of optical glasses and its interpretation. Appl Opt 36 (1997) 1501-1516
    • (1997) Appl Opt , vol.36 , pp. 1501-1516
    • Lambropoulos, J.C.1    Su, X.2    Tong, F.3
  • 7
    • 0014855581 scopus 로고
    • Mechanisms of abrasive polishing
    • Aghan R.L., and Samuels L.E. Mechanisms of abrasive polishing. Wear 16 (1970) 293-301
    • (1970) Wear , vol.16 , pp. 293-301
    • Aghan, R.L.1    Samuels, L.E.2
  • 8
    • 0037326127 scopus 로고    scopus 로고
    • Jianfeng L, Dornfeld DA. Material removel regions in chemical mechanical planarization for submicron integrated circuit fabrication. IEEE 2003; 16(1): 45-56.
  • 9
    • 0030381032 scopus 로고    scopus 로고
    • Effects of particle size, polishing pad and contact pressure in free abrasive polishing
    • Xie Y., and Bharat B. Effects of particle size, polishing pad and contact pressure in free abrasive polishing. Wear 200 (1996) 281-295
    • (1996) Wear , vol.200 , pp. 281-295
    • Xie, Y.1    Bharat, B.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.