Visual servoing for mask alignment in photolithography positioning system

Proceedings of the 2005 IEEE International Conference on Mechatronics, ICM '05

Volumn 2005, Issue , 2005, Pages 762-767

  Lin, Chorng Tyan ^a   Yu, Yuan Chen ^b  

^a METAL INDUSTRIES RESEARCH AND DEVELOPMENT CENTRE   (Taiwan)

^b NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROL SYSTEM ANALYSIS; IMAGE ANALYSIS; MASKS; PHOTOLITHOGRAPHY; PRODUCT DESIGN;

MASK ALIGNMENT; PHOTOLITHOGRAPHY POSITIONING SYSTEMS; SERVOING CONTROL; VISUAL SERVOING;

VISUAL COMMUNICATION;

EID: 33748904198     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICMECH.2005.1529357     Document Type: Conference Paper

References (11)

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8. National Instruments, IMAQ Vision Concepts Manual, USA, 2003.
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