Magnetic viscosity effects in Co-alloy thin films with stacking faults

Journal of Magnetism and Magnetic Materials

Volumn 226-230, Issue PART II, 2001, Pages 1633-1635

  Laidler, H ^a   Holloway, L ^a  

^a UNIVERSITY OF YORK   (United Kingdom)

Author keywords

Thermal activation; Thin films sputtered

Indexed keywords

CHEMICAL ACTIVATION; COBALT; COBALT ALLOYS; MAGNETISM; STACKING FAULTS; VISCOSITY;

ACTIVATION VOLUME; ANISOTROPY FIELD; SPUTTERED THIN FILMS; STACKING FAULT DENSITY; SWITCHING FIELD DISTRIBUTION; THERMAL ACTIVATION; THERMALLY ACTIVATED; THIN FILMS-SPUTTERED;

THIN FILMS;

EID: 33748705741     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(00)01045-3     Document Type: Article

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