Micromechanical behavior of adhesive granular silica layers: Structure deformation

Langmuir

Volumn 22, Issue 18, 2006, Pages 7783-7792

  Uricanu, V I ^a   Duits, M H G ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ADHESIVES; ATOMIC FORCE MICROSCOPY; DEFORMATION; ELECTROLYTES; INDENTATION; MECHANICAL PROPERTIES; SEDIMENTATION; SILICA; YIELD STRESS;

CONFOCAL SCANNING LASER MICROSCOPE (CSLM); COORDINATION NUMBERS; MICROMECHANICAL BEHAVIOR; PARTICLE IMAGE VELOCIMETRY ANALYSIS;

GRANULAR MATERIALS;

EID: 33748569463     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la060753k     Document Type: Article

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