Mechanism of properties of noble ZnS-SiO2 protection layer for phase change optical disk media

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 8 A, 2006, Pages 6294-6307

  Tsu, David V ^a   Ohta, Takeo ^a  

^a Energy Conversion Devices Inc   (United States)

Author keywords

Bonding structure; IR spectroscopy; Optical disk; Phase change material; Protection layer; Thermal conductivity; Thermal stability

Indexed keywords

GRAIN GROWTH; INFRARED SPECTROGRAPHS; OPTICAL DISK STORAGE; OPTICAL RECORDING; THERMAL CONDUCTIVITY; THERMODYNAMIC STABILITY;

BONDING STRUCTURE; PHASE CHANGE MATERIALS; PROTECTION LAYER;

ZINC COMPOUNDS;

EID: 33748532537     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.6294     Document Type: Article

References (40)

1. S. R. Ovshinsky: Phys. Rev. Lett. 21 (1968) 1450.
2. Panasonic Catalog: "Multifunction rewitable optical disk" LF-7110 (1990).
3. T. Ohta, K. Inoue, S. Furukawa, K. Yoshioka, M. Uchida and S. Nakamura: Electronics and Communication Tech. Res. Meet. Rep. CPM 90-35 (1990) p. 43.
4. T. Ohta, M. Uchida, K. Yoshioka, K. Inoue, T. Akiyama, S. Furukawa, K. Kotera and S. Nakamura: Proc. SPIE 1078 (1989) 27.
5. T. Ohta, K. Inoue, M. Uchida, K. Yoshioka, T. Akiyama, S. Furukawa, K. Nagata and S. Nakamura: Jpn. J. Appl. Phys. 28 (1989) 123.
6. T. Ohta, K. Yoshioka and T. Akiyama: Proc. SPIE 1663 (1992) 436.
7. E. K. Kim, S. I. Kwun, S. M. Lee, H. Seo and J. G. Yoon: Phys. Rev. B 61 (2000) 6036.
8. C. Peng and M. Mansuripur: Appl. Opt. 39 (2000) 2347.
9. Handbook of Chemistry and Physics, ed. D. R. Lide (CRC Press, Boca Raton, 1998) 79th ed., p. 14.
10. Advanced Materials, Woburn, MA 01801, USA.
11. MTI Corporation, Richmond, CA 94804, USA, www.mticrystal.com.
12. N. Yamada, E. Ohno, K. Nishiuchi and N. Akahira: J. Appl. Phys. 69 (1991) 2849.
13. D. V. Tsu and D. Strand: Proc. SPIE 4342 (2002) 124.
14. D. V. Tsu: J. Vac. Sci. Technol. A 17 (1999) 1854.
15. D. V. Tsu: J. Vac. Sci. Technol. B 18 (2000) 1796.
16. C. L. Negendra and G. K. M. Thutupalli: Vacuum 31 (1981) 141.
17. National Inst. Standards and Technology, SRM (2023) specular reflection standard.
18. D. Y. Smith, E. Shiles and M. Inokuti: in Handbook of Optical Constants of Solids, ed. E. D. Palik (Academic Press, New York, 1985) p. 369.
19. E. D. Palik and A. Addamiano: in Handbook of Optical Constants of Solids, ed. E. D. Palik (Academic Press, New York, 1985) p. 597.
20. O. S. Heavens: Optical Properties of Thin Solid Films (Dover, New York, 1991) Chap. 4.
21. D. V. Tsu, G. Lucovsky and B. N. Davidson: Phys. Rev. B 40 (1989) 1795.
22. H. R. Philipp: in Handbook of Optical Constants of Solids, ed. E. D. Palik (Academic Press, New York, 1985) p. 749.
23. R. J. Bell and P. Dean: Discuss. Faraday Soc. 50 (1970) 55.
24. P. H. Gaskell: Discuss Faraday Soc. 50 (1970) 82.
25. G. Lucovsky: Solid State Commun. 29 (1979) 571.
26. G. Lucovsky, J. Yang, S. S. Chao, J. E. Tyler and W. Czubatyj: Phys. Rev. B 28 (1983) 3225.
27. B. Begemann, J. Dorschner, Th. Henning and H. Mutschke: Astrophys. J. 464 (1996) L195.
28. P. A. G. O'Hare: Pure Appl. Chem. 71 (1999) 1243.
29. H. Schnöckel and R. Köppe: J. Am. Chem. Soc. 111 (1989) 4583.
30. M. Friesen and H. Schnöckel: Z. Anorg. Allg. Chem. 625 (1999) 1097.
31. Kazuo Nakamoto: Infrared and Raman Spectra of Inorganic and Coordinated Compounds (Wiley-Interscience, New York, 1978) p. 107.
32. H. Schnöckel: private communication.
33. C. Kittel: Introduction to Solid State Physics (Wiley, New York, 1976) 5th ed., p. 144.
34. H. Nakamura, M. Matsuura, K. Kawasaki, Y. Hiki and Y. Kogure: J. Appl. Phys. 79 (1996) 3994.
35. R. Berman: Thermal Conduction in Solids (Clarendon Press, Oxford, 1978) Chap. 9.
36. G. Arfken: Mathematical Methods for Physicists (Academic, New York, 1970) 2nd ed., p. 140.
37. N. W. Ashcroft and N. D. Mermin: Solid State Physics (Saunder's College, Philadelphia, 1976) p. 434.
38. E.-K. Kim, S.-I. Kwun, S.-M. Lee, H. Seo and J.-G. Yoon: Appl. Phys. Lett. 76 (2000) 3864.
39. C. A. Miller and S. Torquato: J. Appl. Phys. 68 (1990) 5486.
40. R. Parsons: in Thin Film Processes II, ed. J. L. Vossen and W. Kern (Academic Press, Boston, 1991) p. 177.