MEMS based lithography for the fabrication of microoptical components

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5347, Issue , 2004, Pages 79-84

  Erdmann, Lars ^a   Deparnay, Arnaud ^a   Wirth, Falk ^a   Brunner, Robert ^a  

^a CARL ZEISS SMT AG   (Germany)

Author keywords

Lithography; MEMS; Microoptics

Indexed keywords

COMPUTER CONTROL; DIFFRACTION GRATINGS; LIGHT REFRACTION; MASKS; MICROELECTROMECHANICAL DEVICES; MICROOPTICS; MICROSTRUCTURE; OPTICAL DEVICES; RAPID PROTOTYPING;

DIGITAL MULTI-MICROMIRROR DEVICES (DMD); MEMS; PIXEL SIZE;

PHOTOLITHOGRAPHY;

EID: 2142845995     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.524447     Document Type: Conference Paper

References (3)

1. Jun Yao, et al., "Coding Gray-tone Mask for Refractive Microlens Fabrication" Microelectronic Engineering 53 (2000) pp. 531-534
2. D.J.D. Carter, et al., "Maskless parallel patterning with zone-plate array lithography" J: Vac. Sci. Technol. B 17(6), 1999, 3449-3452
3. Tasso R. M. Sales et al., "Beam Shaping and Homogenization with Random Microlens Arrays,"Diffractive Optics and Micro-Optics, Tucson, June 2002, pp. 8-10