Synthesis of nano-sized CeO2 via alcohol-water method and its polishing performance on GaAs wafer

Zhongguo Youse Jinshu Xuebao/Chinese Journal of Nonferrous Metals

Volumn 16, Issue 6, 2006, Pages 1064-1069

  Chen, Zhi Gang ^a   Li, Xia Zhang ^b   Chen, Yang ^a   Chen, Jian Qing ^c   Ni, Chao Ying ^d  

^a CHANGZHOU UNIVERSITY   (China)

^b JIANGSU UNIVERSITY   (China)

^c HOHAI UNIVERSITY   (China)

^d UNIVERSITY OF DELAWARE   (United States)

Author keywords

Alcohol water method; GaAs; Nano sized CeO2; Polishing

Indexed keywords

ALCOHOLS; CHEMICAL MECHANICAL POLISHING; OXIDES; PRECIPITATION (CHEMICAL); SEMICONDUCTING GALLIUM ARSENIDE; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CERIA; GAAS WAFER;

NANOSTRUCTURED MATERIALS;

EID: 33748202113     PISSN: 10040609     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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