Quantum states in fabricating poly-Si films

Applied Surface Science

Volumn 252, Issue 23, 2006, Pages 8258-8260

  Jin, Ruimin ^a   Lu, Jingxiao ^a   Ja, Yu ^a   Yang, Shie ^a   Zhang, Liwei ^a  

^a ZHENGZHOU UNIVERSITY   (China)

Author keywords

Conventional furnace annealing; Grain size; PECVD; Pulsed rapid thermal annealing; Quantum states

Indexed keywords

FLOW OF FLUIDS; GRAIN SIZE AND SHAPE; HYDROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASTIC FILMS; QUANTUM THEORY; RAPID THERMAL ANNEALING; SILANES; THERMAL EFFECTS;

ANNEALING TEMPERATURE; CONVENTIONAL FURNACE ANNEALING; PULSED RAPID THERMAL ANNEALING; QUANTUM STATES;

POLYSILICON;

EID: 33748184110     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.10.052     Document Type: Article

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