SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 200, Issue 22-23 SPEC. ISS., 2006, Pages 6583-6587

The structure and hardness of magnetron sputtered Ti-Al-N thin films with low N contents (< 42 at.%)

(6) Oliveira, J C a Manaia, A b Dias, J P b Cavaleiro, A a Teer, D c Taylor, S c

a UNIVERSITY OF COIMBRA (Portugal)

b INSTITUTO PEDRO NUNES (Portugal)

c TEER COATINGS LTD (United Kingdom)

Author keywords

Aluminium; Magnetron; Sputtering; Titanium; Vickers hardness test; X ray diffraction

Indexed keywords

AMORPHOUS FILMS; DEPOSITION; HARDNESS; MAGNETRON SPUTTERING; NITROGEN; STRUCTURE (COMPOSITION); VICKERS HARDNESS TESTING; X RAY DIFFRACTION ANALYSIS;

COMPOSITE TARGETS; DEPOSITION RATE; MAGNETRON SPUTTERED THIN FILMS; NITROGEN DEPOSITION;

THIN FILMS;

AMORPHOUS FILMS; DEPOSITION; HARDNESS; MAGNETRON SPUTTERING; NITROGEN; STRUCTURE (COMPOSITION); THIN FILMS; VICKERS HARDNESS TESTING; X RAY DIFFRACTION ANALYSIS;

EID: 33748164033 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.11.051 Document Type: Article

Times cited : (27)

References (9)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.