Structure and mechanical properties of Ti-Al films deposited by magnetron sputtering

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 395-398

  Oliveira, J C ^a   Manaia, A ^b   Dias, J P ^b   Cavaleiro, Albano ^a   Teer, D ^c   Taylor, S ^c  

^a UNIVERSITY OF COIMBRA   (Portugal)

^b INSTITUTO PEDRO NUNES   (Portugal)

^c TEER COATINGS LTD   (United Kingdom)

Author keywords

Aluminium; Magnetron; Sputtering; Titanium

Indexed keywords

ALUMINUM; COMPOSITION; CRYSTAL ORIENTATION; CRYSTAL STRUCTURE; FRICTION; HARDNESS; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; SPUTTER DEPOSITION; STEEL; TITANIUM; X RAY DIFFRACTION ANALYSIS;

BROAD DIFFRACTION PEAK; FACE CENTERED CUBIC PHASE; HARDNESS VALUES;

THIN FILMS;

MECHANICAL PROPERTY;

EID: 24644465081     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.01.078     Document Type: Article

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