Optical and electrical characteristics of AC glow-discharge plasma in N2O

IEEE Transactions on Plasma Science

Volumn 34, Issue 4 III, 2006, Pages 1497-1502

  Valencia, Horacio Martínez ^a   Yousif, Farouk Bashir ^b   Robledo Martínez, Arturo ^c   Mejia, Fermin Castillo ^d  

^a INSTITUTO DE CIENCIAS FÍSICAS   (Mexico)

^b UNIVERSIDAD AUTÓNOMA DEL ESTADO DE MORELOS   (Mexico)

^c UNIVERSIDAD AUTÓNOMA METROPOLITANA   (Mexico)

^d INSTITUTO DE CIENCIAS NUCLEARES   (Mexico)

Author keywords

AC glow discharge; Emission spectroscopy; Low temperature plasma

Indexed keywords

ELECTRIC PROPERTIES; EMISSION SPECTROSCOPY; LOW TEMPERATURE PROPERTIES; NITROGEN COMPOUNDS; OPTICAL PROPERTIES;

AC GLOW DISCHARGE; GLOW-DISCHARGE PLASMA; LOW-TEMPERATURE PLASMA;

GLOW DISCHARGES;

EID: 33747834667     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2006.877251     Document Type: Article

References (19)

1. L. G. Christophorou and S. R. Hunter, Electron-Molecule Interactions and Their Applications, L. G. Christophorou, Ed. New York: Academic, 1984, p. 317.
2. R. G. Prinn, J. Huang, R. F. Weiss, D. M. Cunnold, P. J. Fraser, P. G. Simmonds, A. McCulloch, C. Harth, P. Salameh, S. O'Doherty, R. H. J. Wang, L. Porter, and B. R. Miller, "Evidence for significant variations of atmospheric hydroxyl radicals in the last two decades," J. Geophys. Res., vol. 88, no. 13, p. 8415, 1983.
3. K. E. Fox and J. Reed, "Dynamics of the N2O laser as measured with a tunable-diode laser," J. Opt. Soc. Amer. B, Opt. Phys., vol. 2, no. 5, p. 807, May 1985.
4. G. Allcock and J.W. McConkey, "Dissociation patterns in N2O following electron impact," Chem. Phys., vol. 34, no. 2, pp. 169-179, Nov. 1978.
5. S. M. Barnett, N. J. Mason, and W. R. Newell, "Production of the N2(A3Σu+) metastable state by electron impact dissociative excitation of N2O," Chem. Phys., vol. 153, no. 1/2, pp. 283-295, May 1991.
6. D. L. Smith and A. S. Chuang, "Chemistry of SiO2 Deposition," J. Electrochem. Soc., vol. 140, no. 5, pp. 1496-1503, May 1993.
7. J. M. Kushner, "Plasma chemistry of He/O2/SiH4 and He/N2O/SiH4 mixtures for remote plasma-activated chemical-vapor deposition of silicon dioxide," J. Appl. Phys., vol. 74, no. 11, p. 6538, Dec. 1993.
8. J. Zeldovich, "The oxidation of nitrogen in combustions and explosions," Acta Phys. Chim., vol. 21, no. 2, p. 577, 1946.
9. B. M. Penetrante and S. E. Scgultheis, Non-thermal plasma techniques for pollution control: Part A - Overview, Fundamentals and Supporting Technologies and Part B: Electron Beam and Electrical Discharge Processing. Berlin, Germany: Springer-Verlag, 1993.
10. M. Baeva, H. Gier, Uhlenbusch, J. Hchele, and J. Steinwandel, "Pulsed microwave discharge at atmospheric pressure for NOx decomposition," Plasma Sources Sci. Technol., vol. 11, no. 1, pp. 1-9, Feb. 2002.
11. T. de los Arcos, C. Domingo, V. G. Herrero, M. M. Sanz, A. Schulz, and I. J. Tanarro, "Diagnostics and kinetic modeling of a hollow cathode N2O discharge," Phys. Chem. A, vol. 102, no. 3, pp. 6282-6291, Jul. 1998.
12. R. K. Marcus, Glow Discharge Spectroscopies. New York: Plenum, 1993.
13. D. Fang and R. K. Marcus, "Parametric evaluation of sputtering in a planar, diode glow discharge - I. Sputtering of oxygen-free hard copper (OFHC)," Spectrochim. Acta B, At. Spectrosc., vol. 43, no. 12, pp. 1451-1460, 1988.
14. Y. S. Park, S. H. Ku, S. H. Hong, H. J. Kim, and E. H. Piepmeier, "Fundamental studies of electrolyte-as-cathode glow discharge-atomic emission spectrometry for the determination of trace metals in flowing water," Spectrochim. Acta B, At. Spectrosc., vol. 53, no. 6-8, pp. 1167-1179, Aug. 1998.
15. W. C. Davis and R. K. Marcus, "An atmospheric pressure glow discharge optical emission source for the direct sampling of liquid media," J. Anal. At. Spectrom., vol. 16, no. 9, pp. 931-937, 2001.
16. R. W. E. Pearse and A. G. Gaydon, The Identification of Molecular Spectra. London, U.K.: Chapman & Hall, 1976.
17. B. F. Gordiets, C. M. Ferreira, G. L. Vasco, J. M. A. H. Loureiro, J. Nahorny, D. Pagnon, M. Touzeau, and M. Vialle, "Kinetic model of a low-pressure N2-O2 flowing glow discharge," IEEE Trans. Plasma Sci., vol. 23, no. 4, p. 750, Aug. 1995.
18. L. Date, K. Radouane, B. Despax, M. Yousfi, H. Caquineau, and A. Hennad, "Analysis of the N2O dissociation in a RF discharge reactor," J. Phys. D, Appl. Phys., vol. 32, no. 13, pp. 1478-1488, Jul. 1999.
19. 2O clusters," J. Phys. B, At. Mol. Opt. Phys., vol. 33, no. 21, pp. 4863-4871, Nov. 2000.