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Volumn , Issue , 2003, Pages 707-711

A reliable wire bonding on 130nm Cu/low-k device

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN OF EXPERIMENTS; DIELECTRIC DEVICES; DIELECTRIC MATERIALS; ION BEAMS; LOW TEMPERATURE PRODUCTION; RECONFIGURABLE HARDWARE; THERMODYNAMIC STABILITY; WIRE;

EID: 33747590590     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/EPTC.2003.1271610     Document Type: Conference Paper
Times cited : (6)

References (9)
  • 2
    • 0009554832 scopus 로고    scopus 로고
    • The challenge of Low k, Issues and Considerations for Accelerated Performance
    • Spring
    • P.Nunam, "The challenge of Low k, Issues and Considerations for Accelerated Performance", Yield Management Solutions, Spring 2000, p. 17.
    • (2000) Yield Management Solutions , pp. 17
    • Nunam, P.1
  • 4
    • 0036292944 scopus 로고    scopus 로고
    • Wire Bonding Proces Impact on Low-K dielectric Material in Damascene Copper Integrated Circuits
    • V.Kripesh, M.Sivakumar, LA Lim, R.Kumar, M.Iyer, "Wire Bonding Proces Impact on Low-K dielectric Material in Damascene Copper Integrated Circuits", ECTC Singapore, 2002, pp.873-880.
    • (2002) ECTC Singapore , pp. 873-880
    • Kripesh, V.1    Sivakumar, M.2    Lim, L.A.3    Kumar, R.4    Iyer, M.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.