Photooxidation of plasma polymerized polydimethylsiloxane film by 172 nm vacuum ultraviolet light irradiation in dilute oxygen

Journal of Applied Physics

Volumn 100, Issue 3, 2006, Pages

  Ichikawa, S ^a  

^a SEIKO EPSON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MOLECULAR STRUCTURE; PHOTONS; PHOTOOXIDATION; PLASMAS; POLYMERIZATION; SILICA; SURFACE ROUGHNESS; THIN FILMS; ULTRAVIOLET LAMPS; ULTRAVIOLET RADIATION; VACUUM APPLICATIONS; X RAY SPECTROSCOPY;

DEGREE OF OXIDATION; ELEMENTAL COMPOSITIONS; MOLECULAR OXYGEN; ROOM TEMPERATURE;

IRRADIATION;

EID: 33747491426     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2227275     Document Type: Article

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