Highly thermal-stable, plasma-polymerized BCB polymer film

Plasma Sources Science and Technology

Volumn 12, Issue 4, 2003, Pages

  Kawahara, J ^a,c   Nakano, A ^b,c   Kinoshita, K ^a,c   Harada, Y ^a   Tagami, M ^a   Tada, M ^a   Hayashi, Y ^a  

^a NEC CORPORATION   (Japan)

^b R and D Process Development   (Japan)

^c MIRAI (MIRAI ASET)   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIVINYL SILOXANE BIS-BENZOCYCLOBUTENE; ORGANIC MONOMER; PLASMA ENHANCED ORGANIC MONOMER VAPOUR POLYMERIZATION;

ANNEALING; COPPER; MONOMERS; PERMITTIVITY; PLASMA POLYMERIZATION; PLASTIC FILMS; POLYIMIDES; THERMODYNAMIC STABILITY; VAPORIZATION;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0345446708     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/12/4/023     Document Type: Article

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