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Volumn 47, Issue 3 PART 2, 2000, Pages 923-927

Application of the LIGA process for fabrication of gas avalanche devices

Author keywords

[No Author keywords available]

Indexed keywords


EID: 33747256272     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (1)

References (13)
  • 9
    • 33747264868 scopus 로고    scopus 로고
    • CXRL toolset, University of Wisconsin.
    • CXRL toolset, University of Wisconsin.
  • 11
    • 33747283466 scopus 로고    scopus 로고
    • Maxwell Electric Field Simulator, Ansoft Corporation, Pittsburgh, PA 15219, USA.
    • Maxwell Electric Field Simulator, Ansoft Corporation, Pittsburgh, PA 15219, USA.
  • 12
    • 33747258045 scopus 로고    scopus 로고
    • Garfield, Version 6. 31, CERN.
    • Garfield, Version 6. 31, CERN.
  • 13
    • 33747305513 scopus 로고    scopus 로고
    • Goodfellow, Cambridge Science Park, Cambridge CB4 4DJ, England.
    • Goodfellow, Cambridge Science Park, Cambridge CB4 4DJ, England.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.