Caesium/xenon dual beam depth profiling: Velocity of the sputtered atom and ionization probability

Applied Surface Science

Volumn 252, Issue 19, 2006, Pages 6440-6443

  Brison, J ^a   Douhard, B ^a   Houssiau, L ^a  

^a UNIVERSITY OF NAMUR   (Belgium)

Author keywords

Caesium; Depth profile; Ionization; MCs; Rh; Si; ToF SIMS

Indexed keywords

ATOMIC PHYSICS; IONIZATION; MATHEMATICAL MODELS; PARTICLE BEAMS; RHODIUM COMPOUNDS; SILICON COMPOUNDS; SURFACE STRUCTURE;

CAESIUM; DEPTH PROFILE; MCS; TOF-SIMS;

XENON;

EID: 33747164789     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.02.066     Document Type: Article

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