Investigation of oxygen annealing effects on RF sputter deposited SiC thin films

Solid-State Electronics

Volumn 50, Issue 7-8, 2006, Pages 1189-1193

  Todi, R M ^a,b   Sundaram, K B ^a,b   Warren, A P ^b   Scammon, K ^b  

^a University of Central Florida   (United States)

^b UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

Oxidation; SiC; XPS

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; MORPHOLOGY; OXIDATION; SILICON CARBIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

BLUE SHIFTING EFFECTS; OXYGEN ANNEALING EFFECTS; RF SPUTTER;

THIN FILMS;

EID: 33747151027     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2006.06.021     Document Type: Article

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