Relations between the optical properties of Cu-Ag:Si3N4 nanocermets and the microstructure of the metallic nanoclusters

Journal of Non-Crystalline Solids

Volumn 352, Issue 23-25, 2006, Pages 2501-2505

  Camelio, S ^a   Babonneau, D ^a   Declemy A ^a   Fonda, E ^b   Traverse, A ^c   Girardeau, T ^a  

^a UNIVERSITÉ DE POITIERS   (France)

^b SYNCHROTRON SOLEIL   (France)

^c UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

Absorption; Atomic absorption; Nanoclusters; Nanocomposites; Rutherford backscattering; Sputtering; X ray diffraction

Indexed keywords

BIMETALS; DIELECTRIC PROPERTIES; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; X RAY DIFFRACTION; X RAY SPECTROSCOPY;

ATOMIC ABSORPTION; NANOCERMETS; NANOCLUSTERS; NANOCOMPOSITES; RUTHERFORD BACKSCATTERING;

CERMETS;

EID: 33746840973     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2006.02.065     Document Type: Article

References (18)

1. Shi H., Zhang L., and Cai W. J. Appl. Phys. 87 (2000) 1572
2. Gaundry M., Lermé J., Cottancin E., Pellarin M., Vialle J.L., Broyer M., Prével B., Treilleux M., and Mélinon P. Phys. Rev. B 64 (2001) 085407
3. Link S., Wang Z.L., and El-Sayed M.A. J. Phys. Chem. B 103 (1999) 3529
4. Battaglin G., Cattaruzza E., Gonella F., Mattei G., Mazzoldi P., Sada C., and Zhang X. Nucl. Instrum. Meth. B 166&167 (2000) 857
5. Hodak J.h., Henglien A., Giersig M., and Hartland G.V. J. Phys. Chem. B 101 (2000) 11708
6. De G., Gusso M., Tapfer L., Catalano M., Gonella F., Mattei G., Mazzoldi P., and Battaglin G. J. Appl. Phys. 80 (1996) 6734
7. Anderson T.S., Magruder III R.H., Wittig J.E., Kinser D.L., and Zuhr R.A. Nucl. Instrum. Meth. B 171 (2000) 401
8. Battaglin G., Cattaruzza E., de Julian Fernandez C., Gonella F., Mattei G., Maurizio C., Mazzoldi P., Miotello A., Sada C., and D'Acapito F. Nucl. Instrum. Meth. B 175-177 (2001) 410
9. Gonzalo J., Babonneau D., Afonso C.N., and Barnes J.P. J. Appl. Phys. 96 (2004) 5163
10. Wei L.C., and Averback R.S. J. Appl. Phys. 81 (1997) 613
11. Goudeau Ph., Mimault J., Girardeau T., Reklaoui K., Proux O., and Branger V. Thin solid films 275 (1996) 25
12. Sayers D.E., Stern E.A., and Lytle F.E. Phys. Rev. Lett. 27 (1971) 1204
13. A. Mickalowizc, Logiciel pour la chimie (Ed. Société Française de Chimie, Paris 1991).
14. Rehr J.J., and Alberts R.C. Rev. Mod. Phys. 72 (2000) 621
15. Girardeau T., Camelio S., Traverse A., Lignou F., Allain J., Naudon A., and Guérin Ph. J. Appl. Phys. 90 (2001) 1788
16. Minh P.T.L., Van N.D., Thuy N.P., Nguyen L.T., Lodder J.C., Thang P.D., and Chan N.T.N. Physica B 327 (2003) 360
17. Chen C., Katikami O., Okamoto S., and Shimada Y. Appl. Phys. Lett. 76 22 (2000) 3218
18. Manikandan D., Mohan S., Magudapathy P., and Nair K.G.M. Nucl. Instrum. Meth. B 198 (2002) 73