Formation of micro-lens by reflow of dual photoresist

2002 International Microprocesses and Nanotechnology Conference, MNC 2002

Volumn , Issue , 2002, Pages 198-199

  Hocheng, H ^a   Pan, C T ^b   Cheng, C C ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

NANOTECHNOLOGY; OPTICAL COMMUNICATION; OPTICAL FIBER COMMUNICATION; PHOTORESISTS; SUBSTRATES;

COMPOSITE LAYER; DIPPING METHOD; EMITTERS AND DETECTORS; FABRICATION METHOD; INNOVATIVE PROCESS; PHOTORESIST REFLOW; PROCESSING TIME; VOLUME MANUFACTURING;

MICROLENSES;

EID: 33746834439     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.2002.1178612     Document Type: Conference Paper

References (3)

1. Choi,J.O., Morse,J.A., Corelli,J.C., Silverman,J.P., Bakhru,H., "Degradation of poly(methylmethacrylate) by deepultraviolet, x-ray, electron beam, and proton beam irradiations", J. Vac. Sc. Technol. B 6(1988), 3633-3642.
2. Hutley, M. C., "Optical techniques for the generation of microlens arrays", J. Mod. Opt. 37(1990), 253-265.
3. Lin Y. S., Pan C. T., Lin K. L., Chen S. C., Yang J. J., Yang J. P., "Polyimide as the pedestal of batch fabricated micro-ball lens and micro-mushroom array",Micro-optoelectromechanical Systems, IEEE Trans., (2001), 337-340.