Mössbauer effect and X-ray diffraction investigation of Si-Fe thin films

Philosophical Magazine

Volumn 86, Issue 32, 2006, Pages 5017-5030

  McGraw, J D ^a   Fleischauer, M D ^a   Dahn, J R ^a   Dunlap, R A ^a  

^a DALHOUSIE UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

FERROMAGNETISM; MOSSBAUER SPECTROSCOPY; SILICON COMPOUNDS; SPUTTERING; X RAY DIFFRACTION;

STRUCTURAL ORDERING; X-RAY MEASUREMENTS; ZEEMAN SPLIT SEXTETS;

THIN FILMS;

EID: 33746834025     PISSN: 14786435     EISSN: 14786443     Source Type: Journal    
DOI: 10.1080/14786430600764864     Document Type: Article

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