ZnO films deposited by RF magnetron sputtering

IEEE Semiconducting and Semi-Insulating Materials Conference, SIMC

Volumn 2005, Issue , 2005, Pages 77-80

  Li, Jing ^a   Wu, Suntao ^a   Kang, Junyong ^a  

^a XIAMEN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; DEPOSITION; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTIES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

MAGNETRON SPUTTERING SYSTEMS; PROCESSING CONDITIONS; ZINC OXIDE (ZNO) NANO FILMS; ZNO FILMS;

ZINC OXIDE;

EID: 33746604420     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SIM.2005.1511390     Document Type: Conference Paper

References (5)

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5. J.J. Chen, Y. Gao, and F. Zeng, et al., Applied Surface Science 223, 318-329, 2004