Strain-induced wrinkling on SiGe free standing film

Applied Physics Letters

Volumn 89, Issue 4, 2006, Pages

  Fedorchenko, Alexander I ^a,d   Wang, An Bang ^a   Mashanov, Vladimir I ^b   Huang, Wu Ping ^c   Cheng, Henry H ^c  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

^c NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^d KUTATELADZE INSTITUTE OF THERMOPHYSICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; NONLINEAR SYSTEMS; RELAXATION PROCESSES; SILICON COMPOUNDS; STRAIN;

BENDING ENERGY; NONLINEAR VON KARMAN PLATE THEORY; STRAIN RELAXATION; STRAIN-INDUCED WRINKLING;

THIN FILMS;

EID: 33746585363     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2236299     Document Type: Article

References (6)

1. V. Ya. Prinz, V. A. Seleznev, A. K. Gutakovsky, A. V. Chehovskiy, V. V. Preobrazhenskii, M. A. Putyato, and T. A. Gavrilova, Physica E (Amsterdam) 6, 828 (2000).
2. S. V. Golod, V. Ya. Prinz, V. I. Mashanov, and A. K. Gutakovsky, Semicond. Sci. Technol. 16, 181 (2001).
3. V. Ya. Prinz, S. V. Golod, V. I. Mashanov, and A. K. Gutakovsky, Inst. Phys. Conf. Ser. 166, 203 (2000).
4. R. Huang and Z. Suo, J. Appl. Phys. 91, 1135 (2002).
5. U. Schnakenberg, W. Benecke, and B. Lochel, Sens. Actuators, A 21 1031 (1990).
6. L. D. Landau and E. M. Lifshitz, Theory of Elasticity (Pergamon, New York, 1986).