C-axis-correlated vortex pinning center induced by dilute Co-doping in pulsed-laser-deposition-ErBa2Cu3Oy films

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 45, Issue 24-28, 2006, Pages

  Horii, Shigeru ^a,f   Ichino, Yusuke ^b,f   Ozaki, Toshinori ^b,f   Matsumoto, Kaname ^c,f   Yoshida, Yutaka ^b,f   Mukaida, Masashi ^d,f   Ichinose, Ataru ^e,f   Shimoyama, Jun Ichi ^a   Kishio, Kohji ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

^c KYOTO UNIVERSITY   (Japan)

^d KYUSHU UNIVERSITY   (Japan)

^e CENTRAL RESEARCH INSTITUTE OF ELECTRIC POWER INDUSTRY   (Japan)

^f JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Co doping; Critical current density; Erba2cu3oy; Oxygen annealing; Thin film

Indexed keywords

COBALT COMPOUNDS; CRITICAL CURRENTS; DOPING (ADDITIVES); POSITIVE IONS; PULSED LASER DEPOSITION; SUBSTRATES;

CO-DOPING; CRITICAL CURRENT DENSITY; ERBA2CU3OY; INHOMOGENEOUS DISTRIBUTION; OXYGEN-ANNEALING;

THIN FILMS;

EID: 33746445482     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.L617     Document Type: Article

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