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Volumn 426-431, Issue II, 2005, Pages 1015-1020

Oxygen post-annealing effects on critical current properties of PLD-ErBa2Cu3Oy films grown at several substrate temperatures

Author keywords

Critical current density; ErBa2Cu3Oy; High temperature resisitivity; Oxygen annealing; Thin film

Indexed keywords

ANNEALING; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); CRYSTALLOGRAPHY; OXYGEN; PARTIAL PRESSURE; PULSED LASER DEPOSITION; SUBSTRATES; THIN FILMS;

ERBA2CU3OY; HIGH TEMPERATURE RESISTIVITY; OXYGEN ANNEALING; OXYGEN PRESSURE;

ERBIUM COMPOUNDS;

EID: 25644451971 PISSN: 09214534 EISSN: None Source Type: Journal
DOI: 10.1016/j.physc.2005.03.038 Document Type: Article

Times cited : (6)

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