Analysis of thin high-k and silicide films by means of heavy ion time-of-flight forward-scattering spectrometry

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 249, Issue 1-2 SPEC. ISS., 2006, Pages 292-296

  Sajavaara, T ^a,b,c   Brijs, B ^c   Giangrandi, S ^c,d   Arstila, K ^e   Vantomme, A ^b   Vandervorst, W ^c,d  

^a UNIVERSITY OF JYVÄSKYLÄ   (Finland)

^b KU LEUVEN   (Belgium)

^c IMEC   (Belgium)

^d UNIVERSITY OF LEUVEN   (Belgium)

^e UNIVERSITY OF HELSINKI   (Finland)

Author keywords

ERDA; High k; NiSi; RBS; TOF FS

Indexed keywords

COMPOSITION; DESORPTION; HEAVY IONS; ION BEAMS; NICKEL COMPOUNDS; TELESCOPES;

ERDA; HIGH-K; MASS SEPARATION; NISI; RBS; TIME-OF-FLIGHT FORWARD-SCATTERING SPECTROMETRY (TOF-FS); TOF-FS;

THIN FILMS;

EID: 33745965846     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.04.049     Document Type: Article

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