Ni-Cr thin film resistor fabrication for GaAs monolithic microwave integrated circuits

Thin Solid Films

Volumn 514, Issue 1-2, 2006, Pages 52-57

  Vinayak, Seema ^a   Vyas, H P ^a   Muraleedharan, K ^b   Vankar, V D ^c  

^a SOLID STATE PHYSICS LABORATORY   (India)

^b DEFENCE METALLURGICAL RESEARCH LABORATORY   (India)

^c INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

Electrical properties and measurements; Metallization; Ni Cr; Resistivity; Sputtering; Thin film resistor

Indexed keywords

CURING; POLYIMIDES; RESISTORS; SEMICONDUCTING GALLIUM ARSENIDE; SILICON WAFERS; SPIN COATING; SPUTTER DEPOSITION; THIN FILM CIRCUITS;

CONTACT RESISTANCE; NI-CR; SHEET RESISTANCE; TEMPERATURE COEFFICIENT; THIN FILM RESISTOR;

MONOLITHIC MICROWAVE INTEGRATED CIRCUITS;

EID: 33745899968     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.02.025     Document Type: Article

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