Across wafer focus mapping and its applications in advanced technology nodes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Zhang, Gary ^a   Demoor, Stephen ^a   Jessen, Scott ^a   He, Qizhi ^a   Yan, Winston ^a   Chevacharoenkul, Sopa ^a   Vellanki, Venugopal ^b   Reynolds, Patrick ^b   Ganeshan, Joe ^c   Hauschild, Jan ^d   Pieters, Marco ^d  

^a TEXAS INSTRUMENTS   (United States)

^b Benchmark Technologies   (United States)

^c ASML US Inc   (United States)

^d ASML   (Netherlands)

Author keywords

Across chip focus variation (ACFV); Across wafer focus variation (AWFV); Dynamic image field; Edge die focus control; Focus and leveling; Focus mapping; Lens aberrations; Pattern density; Phase shift focus monitor (PSFM); Wafer flatness; Wafer topography

Indexed keywords

ACROSS CHIP FOCUS VARIATION (ACFV); ACROSS WAFER FOCUS VARIATION (AWFV); DYNAMIC IMAGE FIELD; FOCUS AND LEVELING; FOCUS MAPPING; LENS ABERRATIONS; PATTERN DENSITY; PHASE SHIFT FOCUS MONITOR (PSFM); WAFER FLATNESS; WAFER TOPOGRAPHY;

ERROR ANALYSIS; FEATURE EXTRACTION; LOGIC PROGRAMMING; MATHEMATICAL MODELS; PHASE SHIFT; PHOTOLITHOGRAPHY;

WSI CIRCUITS;

EID: 33745783088     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.657752     Document Type: Conference Paper

References (5)

1. S. Nakao, J. Sakai, S. Maejima, et. al. "Simple and high sensitive focus monitoring utilizing an aperture on backside of photomask", Proc. SPIE, 5040, 582 (2003).
2. T.A. Bruner, A.L. Martin, et. al. "Quantitative stepper metrology using the focus monitor test mask", Proc. SPIE, 2197, 541 (1994).
3. C. Wang, G. Zhang, S. J. DeMoor, et. al. "Scatterometer-based scanner fingerprinting technique and its applications in image field and ACLV analysis", Proc. SPIE, 5040, 541 (2003).
4. B. La Fontaine, Jan Hauschild, M. Dusa, et.al. "Study of the influence of substrate topography on focusing performance of advanced lithography scanners", Proc. SPIE, 5040, 47 (2003).
5. G. Zhang, Bernd Geh, unpublished results.