Investigation on etch characteristics of GeSbTe thin films for phase-change memory

Integrated Ferroelectrics

Volumn 80, Issue 1, 2006, Pages 207-218

  Park, Ik Hyun ^a   Lee, Jang Woo ^a   Chung, Chee Won ^a  

^a Inha University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; DC GENERATOR MOTORS; INDUCTIVELY COUPLED PLASMA; MASKS; OPTIMIZATION; PHOTORESISTS; REACTIVE ION ETCHING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ANISOTROPIC ETCHING; ETCH RATES; PHASE-CHANGE MEMORY; PHOTORESIST MASKS;

GERMANIUM COMPOUNDS;

EID: 33745763280     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580600657674     Document Type: Article

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