Photothermally enabled lithography for refractive-index modulation in SU-8 photoresist

Optics Letters

Volumn 31, Issue 10, 2006, Pages 1367-1369

  Ong, Biow Hiem ^a   Yuan, Xiaocong ^a   Tao, Shaohua ^a   Tjin, Swee Chuan ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTIVE OPTICAL ELEMENTS (DOE); PHASE DISTRIBUTIONS; PHOTOTHERMAL PROCESS; WAVEFRONT RECONSTRUCTION;

CROSSLINKING; DIFFRACTIVE OPTICS; LIGHT MODULATION; PHOTORESISTS; REFRACTIVE INDEX; WAVEFRONTS;

LITHOGRAPHY;

EID: 33745737480     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.31.001367     Document Type: Article

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