Vacuum-ultraviolet absorption of interstitial O2 and H2O molecules in SiO2 glass

Journal of Non-Crystalline Solids

Volumn 352, Issue 23-25, 2006, Pages 2303-2306

  Kajihara, Koichi ^a   Hirano, Masahiro ^a   Skuja, Linards ^b   Hosono, Hideo ^c  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b UNIVERSITY OF LATVIA   (Latvia)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Absorption; Silica

Indexed keywords

ABSORPTION; ANNEALING; OXYGEN; SILICA; SILICON;

COULOMB REPULSION; HYDROGEN BONDING; LONDON DISPERSION; VACUUM-ULTRAVIOLET (VUV) ABSORPTION;

GLASS;

EID: 33745675465     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2006.02.058     Document Type: Article

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