Planarization for reverse-tone step and flash imprint lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 II, Issue , 2006, Pages

  Lin, Michael W ^a   Chao, Huang Lin ^a   Hao, Jianjun ^b   Kim, Eui Kyoon ^a   Palmieri, Frank ^a   Kim, Woon Chun ^a   Dickey, Michael ^a   Ho, Paul S ^a   Willson, C Grant ^a  

^a The University of Texas at Austin   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

Imprint lithography; Planarization; Reverse tone

Indexed keywords

FILM THICKNESS; IMPRINT LITHOGRAPHY; PLANARIZATION; REVERSE-TONE;

CAPILLARITY; COMPUTER SIMULATION; FINITE DIFFERENCE METHOD; PATTERN RECOGNITION; PRESSURE EFFECTS; TOPOLOGY;

LITHOGRAPHY;

EID: 33745603173     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655626     Document Type: Conference Paper

References (7)

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