Dissolution fundamentals of 193-nm methacrylate based photoresists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Rao, Ashwin ^a   Kang, Shuhui ^a   Vogt, Bryan D ^a   Prabhu, Vivek M ^a   Lin, Eric K ^a   Wu, Wen Li ^a   Turnquest, Karen ^b   Hinsberg, William D ^c  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b SEMATECH   (United States)

^c IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Dissolution; Line edge roughness; Photoresist; Reflectivity; Swelling

Indexed keywords

DEPROTECTION; LINE EDGE ROUGHNESS; QUARTZ CRYSTAL; TETRAMETHYLAMMONIUM HYDROXIDE;

DISSOLUTION; PHOTOLITHOGRAPHY; POLYMETHYL METHACRYLATES; REACTION KINETICS; REFLECTION; SURFACE ROUGHNESS; SWELLING; TUNING;

PHOTORESISTS;

EID: 33745596165     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656540     Document Type: Conference Paper

References (11)

1. Wallraff, G. M.; Hinsberg, W. D. Lithographic imaging techniques for the formation of nanoscopic features. Chemical Reviews 1999, 99 (7), 1801-1821.
2. Arcus, R. Proc.Soc.Photo-Opt.Instrum.Eng. 631, 124-131. 1986.
3. Hinsberg, W.; Houle, F. A.; Lee, S. W.; Ito, H.; Kanazawa, K. Characterization of reactive dissolution and swelling of polymer films using a quartz crystal microbalance and visible and infrared reflectance spectroscopy. Macromolecules 2005, 38 (5), 1882-1898.
4. Prabhu, V. M.; Vogt, B. D.; Wu, W. L.; Douglas, J. F.; Lin, E. K.; Satija, S. K.; Goldfarb, D. L.; Ito, H. Direct measurement of the counterion distribution within swollen polyelectrolyte films. Langmuir 2005, 21 (15), 6647-6651.
5. Tsiartas, P. C; Flanagin, L. W.; Henderson, C. L.; Hinsberg, W. D.; Sanchez, I. C.; Bonnecaze, R. T.; Willson, C. G. The mechanism of phenolic polymer dissolution: A new perspective. Macromolecules 1997, 30 (16), 4656-4664.
6. Yeh, T. F.; Shih, H. Y.; Reiser, A. A Percolation View of Novolak Dissolution and Dissolution Inhibition. Macromolecules 1992, 25 (20), 5345-5352.
7. Voinova, M. V.; Rodahl, M.; Jonson, M.; Kasemo, B. Viscoelastic acoustic response of layered polymer films at fluid-solid interfaces: Continuum mechanics approach. Physica Scripta 1999, 59 (5), 391-396.
8. Rodahl, M.; Kasemo, B. On the measurement of thin liquid overlayers with the quartz-crystal microbalance. Sensors and Actuators A-Physical 1996, 54 (1-3), 448-456.
9. Kanazawa, K. K.; Gordon, J. G. Frequency of A Quartz Microbalance in Contact: with Liquid. Analytical Chemistry 1985, 57 (8), 1770-1771.
10. Buttry, D. A.; Ward, M. D. Measurement of Interfacial Processes at Electrode Surfaces with the Electrochemical Quartz Crystal Microbalance. Chemical Reviews 1992, 92 (6), 1355-1379.
11. Jones, R. L.; Hu, T. J.; Lin, E. K.; Wu, W. L.; Goldfarb, D. L.; Angelopoulos, M.; Trinque, B. C.; Schmid, G. M.; Stewart, M. D.; Willson, C. G. Formation of deprotected fuzzy blobs in chemically amplified resists. Journal of Polymer Science Part B-Polymer Physics 2004, 42 (17), 3063-3069.