The influence of process parameters on precursor evaporation for alumina nanopowder synthesis in an inductively coupled rf thermal plasma

Plasma Sources Science and Technology

Volumn 15, Issue 3, 2006, Pages 441-449

  Shin, J W ^a   Miyazoe, H ^a   Leparoux, M ^a   Siegmann, St ^a   Dorier, J L ^b   Hollenstein, Ch ^b  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ELECTRON MICROSCOPY; EMISSION SPECTROSCOPY; ENTHALPY; EVAPORATION; NANOSTRUCTURED MATERIALS; PARTICLE SIZE ANALYSIS; SYNTHESIS (CHEMICAL);

NANOPOWDERS; OPTICAL EMISSION SPECTROSCOPY; PLASMA ENTHALPY; THERMAL PLASMAS;

PLASMAS;

EID: 33745587076     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/15/3/020     Document Type: Article

References (28)

1. Reed T B 1961 J. Appl. Phys. 32 821
2. Reed T B 1961 J. Appl. Phys. 32 2534
3. Boulos M I 1971 Pure Appl. Chem. 68 1007
4. Pfender E 1999 Plasma Chem. Plasma Process. 19 1
5. Guo J Y, Gitzhofer F and Boulos M I 1997 Plasma Chem. Plasma Process. 17 219
6. Whyman D 2001 Phys. Chem. Chem. Phys. 3 1348
7. Leparoux M, Schreuders C, Shin J W and Siegmann S 2005 Adv. Eng. Mater. 7 349
8. Boulos M I 1976 IEEE Trans. Plasma Sci. 4 28
9. Mostaghimi J, Proulx P and Boulos M I 1984 Plasma Chem. Plasma Process. 4 199
10. Proulx P, Mostaghimi J and Boulos M I 1985 Int. J. Heat Mass Transfer 28 1327
11. Buchner P, Ferfers H, Schubert H and Uhlenbusch J 1997 Plasma Sources Sci. Technol. 6 450
12. Grey J, Jacobs P F and Sherman M P 1962 Rev. Sci. Instrum. 33 738
13. Brossa M and Pfender E 1988 Rev. Sci. Instrum. 8 75
14. Finke J R, Swank W D, Snyder S C and Haggard D C 1993 Rev. Sci. Instrum. 64 3585
15. Rahmane M, Soucy G and Boulos M I 1995 Rev. Sci. Instrum. 66 3424
16. Gindrat M, Dorier J L, Hollenstein Ch, Loch M, Refke A, Salito A and Barbezat G 2002 Proc. 3rd Int. Thermal Spray Conf. (Essen, Germany) p 459
17. Dorier J L, Jodoin B, Gindrat M, Blais A, Hollenstein Ch and Barbezat G 2003 Proc. 16th ISPC 2003 (Taormina, Italy) (Int. Symp. on Plasma Chemistry)
18. Leparoux M and Siegmann S 2003 Proc. Filtech Europa 2003 (Düsseldorf, Germany) p II-242
19. Boulos M I, Fauchais P and Pfender E 1994 Thermal Plasmas: Fundamentals and Applications vol 1 (New York: Plenum)
20. Bohren C F and Huffman D R 1983 Absorption and Scattering of Light by Small Particles (New York: Wiley-Interscience Publication)
21. Jordan G R 1971 Rev. Phys. Technol. 3 128
22. Wilbers A T, Beulens J J and Schram D C 1991 J. Quant. Spectrosc. Radiat. Transfer 46 385
23. Buchner P, Schubert H, Uhlenbusch J and Willée K 1999 Plasma Chem. Plasma Process 19 341
24. Bernardi D, Colombo V, Ghedini E, Mentrelli A and Trombetti T 2005 IEEE Trans. Plasma Sci. 33 425
25. Barin I and Platzki G 1995 Thermochemical Data of Pure Substances (Weinheim, Germany: VCH Publishers)
26. Kitamura T, Shibata K and Takeda K 1993 ISIJ Int. 33 1150
27. Koura S, Tanizaki H, Niiyama M and Iwasaki K 1996 Mater. Sci. Eng. A 208 69
28. Gutsch A, Krämer M, Michael G, Mühlenberg H, Pridöhl M and Zimmermann G 2002 Kona 20 24