Shape-sensitive linewidth measurement with the scanning electron microscope using a model-based library

Scanning

Volumn 23, Issue 2, 2001, Pages 90-91

  Villarrubia, J S ^a   Vladar A E ^a   Lowney, J R ^a   Poster, M T ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33745546934     PISSN: 01610457     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (3)

1. Villarmbia JS et at.: Intel-comparison of SEM, AFM, and electrical linewidths. Proc SPIE, 3998, 84-95 (2000)
2. Villarmbia JS et al.: Linewidth measurement intercomparison on a BESOI sample. Proc SPIE, 3677, 587-598 (1999)
3. Davidson MP, Vladár AE: An inverse scattering approach to SEM line width measurements. Proc SP1E, 3677, 640-649 (1999)