A critical implanted Cl concentration for pit initiation on aluminum thin films

Journal of the Electrochemical Society

Volumn 153, Issue 8, 2006, Pages

  Serna, L M ^a   Zavadil, K R ^a,b   Johnson, C M ^a   Wall, F D ^a,b   Barbour, J C ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

CORRELATION METHODS; ELECTROCHEMISTRY; PITTING;

PITTING POTENTIAL; PURE ALUMINUM THIN FILMS;

THIN FILMS;

EID: 33745506652     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2205172     Document Type: Article

References (29)

1. C. L. McBee and J. Kruger, in Localized Corrosion, B. F. Brown, J. Kruger, and, R. W. Staehle, Editors, p. 252, NACE, Houston, TX (1974).
2. H. Bohni and H. H. Uhlig, J. Electrochem. Soc., 116, 906 (1969).
3. Y. M. Kolotyrkin, J. Electrochem. Soc., 108, 209 (1961).
4. T. P. Hoar and W. R. Jacob, Nature (London), 216, 1299 (1967).
5. L. F. Lin, C. Y. Chao, and D. D. Macdonald, J. Electrochem. Soc., 128, 1194 (1981).
6. E. McCafferty, Corros. Sci., 37, 481 (1995).
7. E. McCafferty, J. Electrochem. Soc., 146, 2863 (1999).
8. N. Sato, Electrochim. Acta, 19, 1683 (1971).
9. T. P. Hoar, Corros. Sci., 7, 341 (1967).
10. A. Kolics, J. C. Polkinghorne, and A. Wieckowski, Electrochim. Acta, 43, 2605 (1998).
11. A. Berzins, R. T. Lowson, and K. J. Mirams, Aust. J. Chem., 30, 1891 (1977).
12. J. O'M. Bockris and Lj. V. Minevski, J. Electroanal. Chem., 349, 375 (1993).
13. F. Brown and W. D. Mackintosh, J. Electrochem. Soc., 120, 1096 (1973).
14. M. Skeldon, K. Shimizu, P. Skeldo, G. E. Thompson, and G. C. Wood, Corros. Sci., 37, 1473 (1995).
15. K. Shimuzu, G. M. Brown, K. Kobayashi, P. Skeldon, G. E. Thompson, and G. C. Wood, Corros. Sci., 41, 1835 (1999).
16. P. M. Natishan, W. E. O'Grady, E. McCafferty, D. E. Ramaker, K. Pandya, and A. Russell, J. Electrochem. Soc., 146, 1737 (1999).
17. S. Yu, J. Electrochem. Soc., 147, 2952 (2000).
18. P. Natishan, Electrochim. Acta, 47, 3131 (2002).
19. C. M. Johnson, F. D. Wall, and J. C. Barbour, Nucl. Instrum. Methods Phys. Res. B, 206, 1062 (2003).
20. F. D. Wall, C. M. Johnson, J. C. Barbour, and M. A. Martinez, J. Electrochem. Soc., 151, B77 (2004).
21. J. F. Zeigler, Transport of Ions in Matter (TRIM) Computer Code, IBM Research Laboratory, Yorktown Heights, New York (1992).
22. C. D. Wagner, in Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy, D. Briggs, and, M. P. Seah, Editors, pp. 477-509, J. Willey & Sons, New York (1983).
23. M. P. Seah, in Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy, D. Briggs, and, M. P. Seah, Editors, pp. 181-216, J. Wiley & Sons, New York (1983).
24. J. H. Scofield, J. Electron Spectrosc. Relat. Phenom., 8, 129 (1976).
25. S. Tanuma, C. J. Powell, and D. R. Penn, Surf. Interface Anal., 20, 77 (1993).
26. P. Marcus, C. Hinnen, and I. Olefjord, Surf. Interface Anal., 20, 923 (1993).
27. R. Kelly and N. Q. Lam, Radiat. Eff., 19, 39 (1973).
28. F. D. Wall, C. M. Johnson, J. C. Barbour, and M. A. Martinez, Electrochem. Solid-State Lett., 7, B35 (2004).
29. D. Elswick, P. Kotula, N. Missert, C. M. Johnson, and J. J. Hren, Unpublished results.