Influence of deposition parameters and post-deposition plasma treatments on the photoluminescence of polymorphous silicon carbon alloys

Journal of Non-Crystalline Solids

Volumn 352, Issue 9-20 SPEC. ISS., 2006, Pages 1357-1360

  Suendo, V ^a   Patriarche, G ^b   Roca i Cabarrocas, P ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b CNRS   (France)

Author keywords

Hydrogen plasma treatment; Particle formation; Photoluminescence; Polymorphous silicon carbon alloys; Silicon nanocrystals

Indexed keywords

AMORPHOUS MATERIALS; DEPOSITION; NANOSTRUCTURED MATERIALS; PARAMETER ESTIMATION; SILICON ALLOYS; TRANSMISSION ELECTRON MICROSCOPY;

HYDROGEN PLASMA TREATMENT; PARTICLE FORMATION; POLYMORPHOUS SILICON CARBON ALLOYS; SILICON NANOCRYSTALS; TEMPERATURE EMISSION;

PLASMA APPLICATIONS;

EID: 33745439476     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.12.037     Document Type: Article

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